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Reducing optical losses in focused-ion-beam etched silicon

dc.contributor.authorSchrauwen, Jonathan
dc.contributor.authorVan Thourhout, Dries
dc.contributor.authorBaets, Roel
dc.contributor.authorKlein, E.
dc.contributor.authorAy, F.
dc.contributor.authorHopman, W.
dc.contributor.authorDe Ridder, R.
dc.date.accessioned2021-10-17T10:38:01Z
dc.date.available2021-10-17T10:38:01Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14451
dc.sourceIIOimport
dc.titleReducing optical losses in focused-ion-beam etched silicon
dc.typeOral presentation
dc.contributor.imecauthorVan Thourhout, Dries
dc.contributor.imecauthorBaets, Roel
dc.contributor.orcidimecVan Thourhout, Dries::0000-0003-0111-431X
dc.contributor.orcidimecBaets, Roel::0000-0003-1266-1319
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference52nd International Conference on Electron, Ion, and Photon Beam Technology & Nanofabrication - EIPBN
dc.source.conferencedate27/05/2008
dc.source.conferencelocationPortland, OR USA
imec.availabilityPublished - open access
imec.internalnotesposter nr. P-2B-2


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