Poly- silicon etch with diluted ammonia: Application to replacement gate integration scheme

Thumbnail
View/open
Metadata
Show full item record
Authors
Sebaai, Farid; del Agua Borniquel, Jose Ignacio; Vos, Rita; Absil, Philippe; Chiarella, Thomas; Vrancken, Christa; Boelen, Pieter; Evans, Baiya
Conference
9th International Symposium on Ultra Clean Processing of Semiconductor Surfaces - UCPSS
Title
Poly- silicon etch with diluted ammonia: Application to replacement gate integration scheme
Publication type
Oral presentation
Embargo date
9999-12-31
Collections