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Plasma etching: from micro- to nanoscale device manufacturing

dc.contributor.authorShamiryan, Denis
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorMilenin, Alexey
dc.contributor.authorBoullart, Werner
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-17T10:41:33Z
dc.date.available2021-10-17T10:41:33Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14461
dc.sourceIIOimport
dc.titlePlasma etching: from micro- to nanoscale device manufacturing
dc.typeProceedings paper
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.source.peerreviewyes
dc.source.conference5th International Symposium on Theoretical and Applied Plasma Chemistry - ISTARC
dc.source.conferencedate3/09/2008
dc.source.conferencelocationIvanovo Russia
imec.availabilityPublished - imec


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