Publication:

Shallow boron implantations in Ge and the role of the pre-amorphization depth

Date

2008

Journal article

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Files

19499.pdf 445.34 KB

Author(s)

;

;

Satta, Alessandra

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Parmentier, Brigitte

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Clarysse, Trudo

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Goossens, Jozefien

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Vandervorst, Wilfried

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Journal

Materials Science in Semiconductor Processing

Statistics

1966 since deposited on 2021-10-17

Acq. date: 2026-04-27