dc.contributor.author | Sioncke, Sonja | |
dc.contributor.author | Brunco, David | |
dc.contributor.author | Meuris, Marc | |
dc.contributor.author | Uwamahoro, Olivier | |
dc.contributor.author | Van Steenbergen, Jan | |
dc.contributor.author | Vrancken, Evi | |
dc.contributor.author | Heyns, Marc | |
dc.date.accessioned | 2021-10-17T10:51:06Z | |
dc.date.available | 2021-10-17T10:51:06Z | |
dc.date.issued | 2008 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/14486 | |
dc.source | IIOimport | |
dc.title | Etch rates of Ge, GaAs and InGaAs in acids, bases and peroxide based mixtures | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Meuris, Marc | |
dc.contributor.imecauthor | Van Steenbergen, Jan | |
dc.contributor.imecauthor | Vrancken, Evi | |
dc.contributor.imecauthor | Heyns, Marc | |
dc.contributor.orcidimec | Meuris, Marc::0000-0002-9580-6810 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 451 | |
dc.source.endpage | 460 | |
dc.source.conference | SiGe, Ge, and Related Compounds 3: Materials, Processing, and Devices | |
dc.source.conferencedate | 13/10/2008 | |
dc.source.conferencelocation | Honolulu, HI USA | |
imec.availability | Published - open access | |
imec.internalnotes | ECS Transactions; Vol. 16, Issue 10 | |