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Thermal and plasma enhanced atomic layer deposition of Al2O3 on GaAs substrates

dc.contributor.authorSioncke, Sonja
dc.contributor.authorCaymax, Matty
dc.contributor.authorConard, Thierry
dc.contributor.authorDelabie, Annelies
dc.contributor.authorFranquet, Alexis
dc.contributor.authorHeyns, Marc
dc.contributor.authorMeuris, Marc
dc.contributor.authorUrbanczyk, Adam
dc.contributor.authorVan Hemmen, J.L.
dc.contributor.authorKeunig, Wytze
dc.contributor.authorKessels, W.M.M.
dc.date.accessioned2021-10-17T10:51:30Z
dc.date.available2021-10-17T10:51:30Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14487
dc.sourceIIOimport
dc.titleThermal and plasma enhanced atomic layer deposition of Al2O3 on GaAs substrates
dc.typeMeeting abstract
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorMeuris, Marc
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference8th International Conference on Atomic Layer Deposition - ALD
dc.source.conferencedate30/06/2008
dc.source.conferencelocationBrugge Belgium
imec.availabilityPublished - open access


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