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Vapor phase doping: an atomic layer deposition approach to n-type doping in classical chemical vapor deposition epitaxy

dc.contributor.authorTakeuchi, Shotaro
dc.contributor.authorNguyen, Duy
dc.contributor.authorLeys, Frederik
dc.contributor.authorLoo, Roger
dc.contributor.authorConard, Thierry
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorCaymax, Matty
dc.date.accessioned2021-10-17T11:07:22Z
dc.date.available2021-10-17T11:07:22Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14532
dc.sourceIIOimport
dc.titleVapor phase doping: an atomic layer deposition approach to n-type doping in classical chemical vapor deposition epitaxy
dc.typeMeeting abstract
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpageP-66
dc.source.conference8th International Conference on Atomic Layer Deposition - ALD
dc.source.conferencedate29/06/2008
dc.source.conferencelocationBrugge Belgium
imec.availabilityPublished - open access


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