Publication:
Benefits and side effects of high temperature anneal used to reduce threading dislocation defects in epitaxial Ge Layers on Si substrates
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1971 since deposited on 2021-10-17
1last month
Acq. date: 2025-12-08
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Metrics
Views
1971 since deposited on 2021-10-17
1last month
Acq. date: 2025-12-08
Citations