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Design split algorithms validation for DPT implementation at 32 nm and beyond

dc.contributor.authorTritchkov, Alexander
dc.contributor.authorKempsell, Monica
dc.contributor.authorGlotov, Petr
dc.contributor.authorSahouria, Emile
dc.contributor.authorKomirenko, Sergiy
dc.contributor.authorWiaux, Vincent
dc.date.accessioned2021-10-17T11:25:44Z
dc.date.available2021-10-17T11:25:44Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14581
dc.sourceIIOimport
dc.titleDesign split algorithms validation for DPT implementation at 32 nm and beyond
dc.typeProceedings paper
dc.contributor.imecauthorWiaux, Vincent
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference5th International Symposium on Immersion Lithography Extensions
dc.source.conferencedate22/09/2008
dc.source.conferencelocationDen Haag Nederland
imec.availabilityPublished - open access
imec.internalnotese-proceedings


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