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In situ and real time studies of wet chemical silicon cleaning reactions

dc.contributor.authorSchmidt, Harald
dc.contributor.authorTeerlinck, Ivo
dc.contributor.authorStorm, Wolfgang
dc.contributor.authorBender, Hugo
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-09-29T15:22:15Z
dc.date.available2021-09-29T15:22:15Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1458
dc.sourceIIOimport
dc.titleIn situ and real time studies of wet chemical silicon cleaning reactions
dc.typeProceedings paper
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorHeyns, Marc
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage480
dc.source.endpage491
dc.source.conferenceProceedings of the4th International Symposium on Cleaning technology in Semiconductor Device Manufacturing
dc.source.conferencedate9/10/1995
dc.source.conferencelocationChicago, IL USA
imec.availabilityPublished - open access
imec.internalnotesECS Proceedings; Vol. 95-20


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