Show simple item record

Improved low-k dielectric properties using He/H2 plasma for resist removal

dc.contributor.authorUrbanowicz, Adam
dc.contributor.authorShamiryan, Denis
dc.contributor.authorMarsik, Premysl
dc.contributor.authorTravaly, Youssef
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorVanstreels, Kris
dc.contributor.authorFerchichi, Abdelkarim
dc.contributor.authorDe Roest, David
dc.contributor.authorSprey, Hessel
dc.contributor.authorMatsushita, K.
dc.contributor.authorKaneko, S.
dc.contributor.authorTsuji, N.
dc.contributor.authorLuo, S.
dc.contributor.authorEscorcia, O.
dc.contributor.authorBerry, Ivan
dc.contributor.authorWaldfried, Carlo
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-17T11:29:15Z
dc.date.available2021-10-17T11:29:15Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14590
dc.sourceIIOimport
dc.titleImproved low-k dielectric properties using He/H2 plasma for resist removal
dc.typeMeeting abstract
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorVanstreels, Kris
dc.contributor.imecauthorDe Roest, David
dc.contributor.imecauthorSprey, Hessel
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecVanstreels, Kris::0000-0002-4420-0966
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.conferenceAdvanced Metallization Conference - AMC
dc.source.conferencedate23/09/2008
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record