Improved low-k dielectric properties using He/H2 plasma for resist removal

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Authors
Urbanowicz, Adam; Shamiryan, Denis; Marsik, Premysl; Travaly, Youssef; Verdonck, Patrick; Vanstreels, Kris; Ferchichi, Abdelkarim; De Roest, David; Sprey, Hessel; Matsushita, K.; Kaneko, S.; Tsuji, N.; Luo, S.; Escorcia, O.; Berry, Ivan; Waldfried, Carlo; De Gendt, Stefan; Baklanov, Mikhaïl
Conference
Advanced Metallization Conference - AMC
Title
Improved low-k dielectric properties using He/H2 plasma for resist removal
Publication type
Meeting abstract
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