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Aging phenomena in the removal of nano-particles from Si wafers

dc.contributor.authorVereecke, Guy
dc.contributor.authorVeltens, J.
dc.contributor.authorXu, Kaidong
dc.contributor.authorEitoku, A.
dc.contributor.authorSano, Ken-Ichi
dc.contributor.authorArnauts, Sophia
dc.contributor.authorKenis, Karine
dc.contributor.authorSnow, J.
dc.contributor.authorVinckier, Chris
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-17T12:27:44Z
dc.date.available2021-10-17T12:27:44Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14739
dc.sourceIIOimport
dc.titleAging phenomena in the removal of nano-particles from Si wafers
dc.typeProceedings paper
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage151
dc.source.endpage154
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces VIII - UCPSS
dc.source.conferencedate18/09/2006
dc.source.conferencelocationAntwerpen Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid State Phenomena; Vol. 134


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