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30nm half-pitch metal patterning using MotifTM CD shrink technique and double patterning

dc.contributor.authorVersluijs, Janko
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorGoossens, Danny
dc.contributor.authorOp de Beeck, Maaike
dc.contributor.authorVandeweyer, Tom
dc.contributor.authorWiaux, Vincent
dc.contributor.authorStruyf, Herbert
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorBrouri, Mohand
dc.contributor.authorVertommen, Johan
dc.contributor.authorKim, Ji Soo
dc.contributor.authorZhu, Helen
dc.contributor.authorSadjadi, Reza
dc.date.accessioned2021-10-17T12:34:25Z
dc.date.available2021-10-17T12:34:25Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14755
dc.sourceIIOimport
dc.title30nm half-pitch metal patterning using MotifTM CD shrink technique and double patterning
dc.typeProceedings paper
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorGoossens, Danny
dc.contributor.imecauthorOp de Beeck, Maaike
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.orcidimecOp de Beeck, Maaike::0000-0002-2700-6432
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage69242C
dc.source.conferenceOptical Microlithography XXI
dc.source.conferencedate24/02/2008
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; vol. 6924


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