30nm half-pitch metal patterning using MotifTM CD shrink technique and double patterning

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Authors
Versluijs, Janko; de Marneffe, Jean-Francois; Goossens, Danny; Op de Beeck, Maaike; Vandeweyer, Tom; Wiaux, Vincent; Struyf, Herbert; Maenhoudt, Mireille; Brouri, Mohand; Vertommen, Johan; Kim, Ji Soo; Zhu, Helen; Sadjadi, Reza
Conference
Optical Microlithography XXI
Title
30nm half-pitch metal patterning using MotifTM CD shrink technique and double patterning
Publication type
Proceedings paper
Embargo date
9999-12-31
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