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30nm half-pitch metal patterning using MotifTM CD shrink technique and double patterning
Publication:
30nm half-pitch metal patterning using MotifTM CD shrink technique and double patterning
Date
2008
Proceedings Paper
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14688.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Versluijs, Janko
;
de Marneffe, Jean-Francois
;
Goossens, Danny
;
Op de Beeck, Maaike
;
Vandeweyer, Tom
;
Wiaux, Vincent
;
Struyf, Herbert
;
Maenhoudt, Mireille
;
Brouri, Mohand
;
Vertommen, Johan
;
Kim, Ji Soo
;
Zhu, Helen
;
Sadjadi, Reza
Journal
Abstract
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2006
since deposited on 2021-10-17
Acq. date: 2025-10-22
Citations
Metrics
Views
2006
since deposited on 2021-10-17
Acq. date: 2025-10-22
Citations