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Confined chemical cleaning: a novel concept evaluated for front end of line applications

dc.contributor.authorVos, Ingrid
dc.contributor.authorPeeters, Stefan
dc.contributor.authorVerbeeck, Rita
dc.contributor.authorBoullart, Werner
dc.contributor.authorVertommen, Johan
dc.date.accessioned2021-10-17T12:37:59Z
dc.date.available2021-10-17T12:37:59Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14764
dc.sourceIIOimport
dc.titleConfined chemical cleaning: a novel concept evaluated for front end of line applications
dc.typeProceedings paper
dc.contributor.imecauthorVos, Ingrid
dc.contributor.imecauthorPeeters, Stefan
dc.contributor.imecauthorVerbeeck, Rita
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage121
dc.source.endpage124
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces VIII - UCPSS
dc.source.conferencedate17/09/2006
dc.source.conferencelocationAntwerpen Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid State Phenomena; vol. 134


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