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Optimization of Al2O3 interpoly dielectric for embedded flash memory applications

dc.contributor.authorWellekens, Dirk
dc.contributor.authorDe Vos, Joeri
dc.contributor.authorVan Houdt, Jan
dc.contributor.authorvan der Zanden, Koen
dc.date.accessioned2021-10-17T12:45:47Z
dc.date.available2021-10-17T12:45:47Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14783
dc.sourceIIOimport
dc.titleOptimization of Al2O3 interpoly dielectric for embedded flash memory applications
dc.typeProceedings paper
dc.contributor.imecauthorWellekens, Dirk
dc.contributor.imecauthorDe Vos, Joeri
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.orcidimecDe Vos, Joeri::0000-0002-9332-9336
dc.contributor.orcidimecVan Houdt, Jan::0000-0003-1381-6925
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage12
dc.source.endpage15
dc.source.conferenceJoint Non-Volatile Semiconductor Memory Workshop and International Conference on Memory Technology and Design - NVSMW-ICMTD
dc.source.conferencedate18/05/2008
dc.source.conferencelocationOpio France
imec.availabilityPublished - open access


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