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Split and design guidelines for double patterning

dc.contributor.authorWiaux, Vincent
dc.contributor.authorVerhaegen, Staf
dc.contributor.authorCheng, Shaunee
dc.contributor.authorIwamoto, Fumio
dc.contributor.authorJaenen, Patrick
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorMatsuda, Takashi
dc.contributor.authorPostnikov, Sergey
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-17T12:47:06Z
dc.date.available2021-10-17T12:47:06Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14786
dc.sourceIIOimport
dc.titleSplit and design guidelines for double patterning
dc.typeProceedings paper
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorVandenberghe, Geert
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage692409
dc.source.conferenceOptical Microlithography XXI
dc.source.conferencedate24/02/2008
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; vol. 6924


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