Process-induced positive charges in Hf-based gate stacks

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Authors

Zhao, C.Z.; Zhang, J.F.; Chang, M.H.; Peaker, A.R.; Hall, S.; Groeseneken, Guido; Pantisano, Luigi; De Gendt, Stefan; Heyns, Marc

ISSN

0021-8979

Issue

1

Journal

Journal of Applied Physics

Volume

103

Title

Process-induced positive charges in Hf-based gate stacks

Publication type

Journal article

Embargo date

9999-12-31

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