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Articles
A DRAM compatible Cu contact using self-aligned Ta-silicide and Ta-barrier
Publication:
A DRAM compatible Cu contact using self-aligned Ta-silicide and Ta-barrier
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Date
2008
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Zhao, Chao
;
Ahn, Jae Young
;
Horiguchi, Naoto
;
Demuynck, Steven
;
Tokei, Zsolt
Journal
Microelectronic Engineering
Abstract
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1966
since deposited on 2021-10-17
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Acq. date: 2026-01-08
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Metrics
Views
1966
since deposited on 2021-10-17
1
last month
1
last week
Acq. date: 2026-01-08
Citations