Development of a DRAM compatible Cu contact using self-aligned Ta-silicide and Ta-barrier

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Authors
Zhao, Chao; Demuynck, Steven; Tokei, Zsolt; Horiguchi, Naoto; Ahn, J.Y.
Conference
Materials for Advanced Metallization Workshop - MAM
Title
Development of a DRAM compatible Cu contact using self-aligned Ta-silicide and Ta-barrier
Publication type
Oral presentation
Embargo date
9999-12-31
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