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Basic aspects of the formation and activation of boron junctions using plasma immersion ion implantation

dc.contributor.authorZschaetzsch, Gerd
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorHoffmann, Thomas
dc.contributor.authorGoossens, Jozefien
dc.contributor.authorEveraert, Jean-Luc
dc.contributor.authordel Agua Borniquel, Jose Ignacio
dc.contributor.authorPoon, T.
dc.date.accessioned2021-10-17T13:15:45Z
dc.date.available2021-10-17T13:15:45Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14855
dc.sourceIIOimport
dc.titleBasic aspects of the formation and activation of boron junctions using plasma immersion ion implantation
dc.typeProceedings paper
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorEveraert, Jean-Luc
dc.contributor.imecauthordel Agua Borniquel, Jose Ignacio
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage464
dc.source.endpage464
dc.source.conference17th International Conference in Ion Implantation Technology - IIT
dc.source.conferencedate8/06/2008
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - open access
imec.internalnotesAIP Conference Proceedings; Vol. 1066


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