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Atomic layer deposition of GdHfOx thin films

dc.contributor.authorAdelmann, Christoph
dc.contributor.authorPierreux, Dieter
dc.contributor.authorSwerts, Johan
dc.contributor.authorRosseel, Erik
dc.contributor.authorShi, Xiaoping
dc.contributor.authorTielens, Hilde
dc.contributor.authorKesters, Jurgen
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorKittl, Jorge
dc.date.accessioned2021-10-17T21:17:10Z
dc.date.available2021-10-17T21:17:10Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14870
dc.sourceIIOimport
dc.titleAtomic layer deposition of GdHfOx thin films
dc.typeProceedings paper
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorPierreux, Dieter
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorTielens, Hilde
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.source.peerreviewyes
dc.source.beginpage243
dc.source.endpage251
dc.source.conferenceAtomic Layer Deposition Applications 5
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
dc.identifier.urlhttp://dx.doi.org/10.1149/1.3205059
imec.availabilityPublished - imec
imec.internalnotesECS Transactions; Vol. 25, issue 4


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