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Printing the contact and metal layers for the 32 and 22 nm node: comparing positive and negative development process

dc.contributor.authorBekaert, Joost
dc.contributor.authorVan Look, Lieve
dc.contributor.authorWiaux, Vincent
dc.contributor.authorTruffert, Vincent
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorReybrouck, Mario
dc.contributor.authorTarutani, S.
dc.date.accessioned2021-10-17T21:21:28Z
dc.date.available2021-10-17T21:21:28Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14967
dc.sourceIIOimport
dc.titlePrinting the contact and metal layers for the 32 and 22 nm node: comparing positive and negative development process
dc.typeProceedings paper
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorTruffert, Vincent
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorReybrouck, Mario
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecTruffert, Vincent::0000-0001-7851-830X
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference6th International Symposium on Immersion Lithography Extensions
dc.source.conferencedate22/10/2009
dc.source.conferencelocationPrague Czech Republic
imec.availabilityPublished - open access
imec.internalnotese-proceedings Sematech-website


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