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Use of MIR-FTIR and k-value measurements to assess potential solutions to reduce damage during porous low-k integration

dc.contributor.authorBeynet, Julien
dc.contributor.authorDe Roest, David
dc.contributor.authorRochat, N.
dc.contributor.authorKellens, Kristof
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorSprey, Hessel
dc.date.accessioned2021-10-17T21:23:44Z
dc.date.available2021-10-17T21:23:44Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14997
dc.sourceIIOimport
dc.titleUse of MIR-FTIR and k-value measurements to assess potential solutions to reduce damage during porous low-k integration
dc.typeProceedings paper
dc.contributor.imecauthorDe Roest, David
dc.contributor.imecauthorKellens, Kristof
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorSprey, Hessel
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage275
dc.source.endpage280
dc.source.conferenceInternational Semiconductor Technology Conference - ISTC/CSTIC
dc.source.conferencedate19/03/2009
dc.source.conferencelocationShanghai China
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 18, nr. 1


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