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Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)

dc.contributor.authorBeynet, Julien
dc.contributor.authorWong, Patrick
dc.contributor.authorMiller, Andy
dc.contributor.authorLocorotondo, Sabrina
dc.contributor.authorVangoidsenhoven, Diziana
dc.contributor.authorYoon, Tae-Ho
dc.contributor.authorDemand, Marc
dc.contributor.authorPark, Hyung-Sang
dc.contributor.authorVandeweyer, Tom
dc.contributor.authorSprey, Hessel
dc.contributor.authorYoo, Yong-Min
dc.contributor.authorMaenhoudt, Mireille
dc.date.accessioned2021-10-17T21:23:50Z
dc.date.available2021-10-17T21:23:50Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14998
dc.sourceIIOimport
dc.titleLow temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)
dc.typeProceedings paper
dc.contributor.imecauthorWong, Patrick
dc.contributor.imecauthorMiller, Andy
dc.contributor.imecauthorLocorotondo, Sabrina
dc.contributor.imecauthorVangoidsenhoven, Diziana
dc.contributor.imecauthorDemand, Marc
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorSprey, Hessel
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage75201J
dc.source.conferenceSPIE Lithography Asia Taiwan
dc.source.conferencedate18/11/2009
dc.source.conferencelocationTaipei Taiwan
imec.availabilityPublished - open access
imec.internalnotesSPIE Proceedings; Vol. 7520


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