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Non-destructive extraction of junction depths of active doping profiles from photomodulated optical reflectance offset curves

dc.contributor.authorBogdanowicz, Janusz
dc.contributor.authorDortu, Fabian
dc.contributor.authorClarysse, Trudo
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorRosseel, Erik
dc.contributor.authorNguyen, Duy
dc.contributor.authorShaughnessy, Derrick
dc.contributor.authorSalnick, Alex
dc.contributor.authorNicolaides, Lena
dc.date.accessioned2021-10-17T21:25:24Z
dc.date.available2021-10-17T21:25:24Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15015
dc.sourceIIOimport
dc.titleNon-destructive extraction of junction depths of active doping profiles from photomodulated optical reflectance offset curves
dc.typeProceedings paper
dc.contributor.imecauthorBogdanowicz, Janusz
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorRosseel, Erik
dc.contributor.orcidimecBogdanowicz, Janusz::0000-0002-7503-8922
dc.source.peerreviewno
dc.source.conferenceInternational Workshop on INSIGHT in Semiconductor Device Fabrication, Metrology and Modeling
dc.source.conferencedate26/04/2009
dc.source.conferencelocationNapa, CA USA
imec.availabilityPublished - imec


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