Show simple item record

Recombination probabilities of O and H atoms on the surface of nanoporous low dielectric constant SiCOH films

dc.contributor.authorBraginsky, O.V.
dc.contributor.authorKovalev, A.S.
dc.contributor.authorLopaev, D.V.
dc.contributor.authorMalykhin, E.M.
dc.contributor.authorMankelevich, Y.A.
dc.contributor.authorRakhimova, T.V.
dc.contributor.authorRakhimov, A.T.
dc.contributor.authorVasilieva, A.N.
dc.contributor.authorZyryanov, S.M.
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-17T21:27:22Z
dc.date.available2021-10-17T21:27:22Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15034
dc.sourceIIOimport
dc.titleRecombination probabilities of O and H atoms on the surface of nanoporous low dielectric constant SiCOH films
dc.typeProceedings paper
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage573
dc.source.endpage579
dc.source.conferenceAdvanced Metallization Conference 2008 (AMC 2008)
dc.source.conferencedate8/10/2008
dc.source.conferencelocationTokyo Japan
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
18551.pdf
Size:
1.597Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record