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Compensation of overlay errors due to mask bending and non-flatness for EUV masks

dc.contributor.authorChandhok, Manish
dc.contributor.authorGoyal, Sanjay
dc.contributor.authorCarson, Steve
dc.contributor.authorPark, Seh-Jin
dc.contributor.authorZhang, Guojing
dc.contributor.authorMyers, Alan
dc.contributor.authorLeeson, Michael
dc.contributor.authorKamna, Marilyn
dc.contributor.authorMartinez, Fabian
dc.contributor.authorStivers, Alan
dc.contributor.authorLorusso, Gian
dc.contributor.authorHermans, Jan
dc.contributor.authorHendrickx, Eric
dc.contributor.authorGovindjee, Sanjay
dc.contributor.authorBrandstetter, Gerd
dc.contributor.authorLaursen, Tod
dc.date.accessioned2021-10-17T21:32:52Z
dc.date.available2021-10-17T21:32:52Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15078
dc.sourceIIOimport
dc.titleCompensation of overlay errors due to mask bending and non-flatness for EUV masks
dc.typeProceedings paper
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage72710G
dc.source.conferenceAlternative Lithographic Technologies
dc.source.conferencedate22/02/2009
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 7271


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