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Characterization of plasma damage in low-k films by TVS measurements

dc.contributor.authorCiofi, Ivan
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorCalbo, Giovanni
dc.contributor.authorTokei, Zsolt
dc.contributor.authorBeyer, Gerald
dc.date.accessioned2021-10-17T21:35:39Z
dc.date.available2021-10-17T21:35:39Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15098
dc.sourceIIOimport
dc.titleCharacterization of plasma damage in low-k films by TVS measurements
dc.typeProceedings paper
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.source.peerreviewno
dc.source.beginpage1156-D01-08
dc.source.conferenceMaterials, Processes and Reliability for Advanced Interconnects for Micro- and Nanoelectronics
dc.source.conferencedate13/04/2009
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec
imec.internalnotesMRS Symposium Proceedings; Vol. 1156


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