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Photo-voltage versus micro-probe sheet resistance measurements on ultra-shallow structures

dc.contributor.authorClarysse, Trudo
dc.contributor.authorMoussa, Alain
dc.contributor.authorParmentier, Brigitte
dc.contributor.authorBogdanowicz, Janusz
dc.contributor.authorCornagliotti, Emanuele
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorBender, Hugo
dc.contributor.authorPfeffer, Markus
dc.contributor.authorSchellenberger, Martin
dc.contributor.authorNielsen, Peter
dc.contributor.authorThorsteinsson, Sune
dc.contributor.authorLin, Rong
dc.contributor.authorPetersen, Dirch
dc.date.accessioned2021-10-17T21:37:52Z
dc.date.available2021-10-17T21:37:52Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15114
dc.sourceIIOimport
dc.titlePhoto-voltage versus micro-probe sheet resistance measurements on ultra-shallow structures
dc.typeProceedings paper
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorParmentier, Brigitte
dc.contributor.imecauthorBogdanowicz, Janusz
dc.contributor.imecauthorCornagliotti, Emanuele
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorBender, Hugo
dc.contributor.orcidimecBogdanowicz, Janusz::0000-0002-7503-8922
dc.source.peerreviewno
dc.source.conferenceInternational Workshop on INSIGHT in Semiconductor Device Fabrication, Metrology and Modeling
dc.source.conferencedate26/04/2009
dc.source.conferencelocationNapa, CA USA
imec.availabilityPublished - imec


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