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Integration of porogen-based low-k films: influence of capping layer thickness and long thermal anneals on low-k damage and reliability
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Authors
De Roest, David
;
Vereecke, Bart
;
Huffman, Craig
;
Heylen, Nancy
;
Croes, Kristof
;
Arai, H
;
Takamure, N
;
Beynet, Julien
;
Sprey, Hessel
;
Matsushita, K
;
Kobayashi, N
;
Verdonck, Patrick
;
Demuynck, Steven
;
Beyer, Gerald
;
Tokei, Zsolt
Conference
Advanced Metallization Conference
Title
Integration of porogen-based low-k films: influence of capping layer thickness and long thermal anneals on low-k damage and reliability
Publication type
Meeting abstract
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