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Plasma etch chamber wall deposits – impact on etch species density and evaluation of cleaning procedures

dc.contributor.authorDictus, Dries
dc.contributor.authorShamiryan, Denis
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorBoullart, Werner
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorVinckier, Chris
dc.date.accessioned2021-10-17T21:59:06Z
dc.date.available2021-10-17T21:59:06Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15238
dc.sourceIIOimport
dc.titlePlasma etch chamber wall deposits – impact on etch species density and evaluation of cleaning procedures
dc.typeMeeting abstract
dc.contributor.imecauthorDictus, Dries
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDictus, Dries::0000-0002-7896-1747
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpagePS2-ThA11
dc.source.conferenceAVS 56th International Symposium & Exhibition
dc.source.conferencedate8/11/2009
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec


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