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Challenges building a 22nm node 6T-SRAM cell using immersion lithography

dc.contributor.authorErcken, Monique
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorBaerts, Christina
dc.contributor.authorBrus, Stephan
dc.contributor.authorDe Backer, Johan
dc.contributor.authorDemand, Marc
dc.contributor.authorDelvaux, Christie
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorLocorotondo, Sabrina
dc.contributor.authorVandeweyer, Tom
dc.contributor.authorVeloso, Anabela
dc.contributor.authorVerhaegen, Staf
dc.date.accessioned2021-10-17T22:07:24Z
dc.date.available2021-10-17T22:07:24Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15279
dc.sourceIIOimport
dc.titleChallenges building a 22nm node 6T-SRAM cell using immersion lithography
dc.typeProceedings paper
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorBaerts, Christina
dc.contributor.imecauthorBrus, Stephan
dc.contributor.imecauthorDe Backer, Johan
dc.contributor.imecauthorDemand, Marc
dc.contributor.imecauthorDelvaux, Christie
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorLocorotondo, Sabrina
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference6th International Symposium on Immersion Lithography Extensions
dc.source.conferencedate22/10/2009
dc.source.conferencelocationPrague Czech Republic
imec.availabilityPublished - open access
imec.internalnotese-proceedings Sematech-website


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