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Contour-quality assessment for OPC model calibration

dc.contributor.authorFilitchkin, Paul
dc.contributor.authorDo, Thuy
dc.contributor.authorKusnadi, Ir
dc.contributor.authorSturtevant, John
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorVan de Kerkhove, Jeroen
dc.date.accessioned2021-10-17T22:13:29Z
dc.date.available2021-10-17T22:13:29Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15308
dc.sourceIIOimport
dc.titleContour-quality assessment for OPC model calibration
dc.typeProceedings paper
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorVan de Kerkhove, Jeroen
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage72722Q
dc.source.conferenceMetrology, Inspection and Process Control for Microlithography XXIII
dc.source.conferencedate22/02/2009
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 7272


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