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Dense lines created by spacer DPT scheme: process control by local dose adjustment using advanced scanner control

dc.contributor.authorFinders, Jo
dc.contributor.authorDusa, Mircea
dc.contributor.authorVleeming, Bert
dc.contributor.authorFliervoet, Timon
dc.contributor.authorHepp, Birgitt
dc.contributor.authorMegens, henry
dc.contributor.authorGroenendijk, Remco
dc.contributor.authorQuaedackers, John
dc.contributor.authorMos, Evert
dc.contributor.authorLeewis, Christian
dc.contributor.authorBornebroek, Frank
dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorLeblans, Marc
dc.contributor.authorVandeweyer, Tom
dc.contributor.authorMurdoch, Gayle
dc.contributor.authorAltamirano Sanchez, Efrain
dc.date.accessioned2021-10-17T22:13:45Z
dc.date.available2021-10-17T22:13:45Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15309
dc.sourceIIOimport
dc.titleDense lines created by spacer DPT scheme: process control by local dose adjustment using advanced scanner control
dc.typeProceedings paper
dc.contributor.imecauthorDusa, Mircea
dc.contributor.imecauthorFliervoet, Timon
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorMurdoch, Gayle
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage72740R
dc.source.conferenceOptical Microlithography XXII
dc.source.conferencedate23/02/2009
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://spiedl.aip.org/
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 7274


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