Authors

Fonseca, Carlos; Somervell, M.; Scheer, S.; Kuwahara, Y.; Nafus, Kathleen; Gronheid, Roel; Tarutani, S.

Conference

6th International Symposium on Immersion Lithography Extensions

Title

Exploration of new resist chemistries and process methods for enabling dual-tone development

Publication type

Proceedings paper

Embargo date

9999-12-31