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Exploration of new resist chemistries and process methods for enabling dual-tone development

dc.contributor.authorFonseca, Carlos
dc.contributor.authorSomervell, M.
dc.contributor.authorScheer, S.
dc.contributor.authorKuwahara, Y.
dc.contributor.authorNafus, Kathleen
dc.contributor.authorGronheid, Roel
dc.contributor.authorTarutani, S.
dc.date.accessioned2021-10-17T22:16:07Z
dc.date.available2021-10-17T22:16:07Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15320
dc.sourceIIOimport
dc.titleExploration of new resist chemistries and process methods for enabling dual-tone development
dc.typeProceedings paper
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference6th International Symposium on Immersion Lithography Extensions
dc.source.conferencedate22/10/2009
dc.source.conferencelocationPrague Czech Republic
imec.availabilityPublished - open access
imec.internalnotese-proceedings Sematech website


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