dc.contributor.author | Goethals, Mieke | |
dc.contributor.author | Demuynck, Steven | |
dc.contributor.author | Van Roey, Frieda | |
dc.contributor.author | Baudemprez, Bart | |
dc.contributor.author | Hermans, Jan | |
dc.contributor.author | Huffman, Craig | |
dc.contributor.author | Lazzarino, Frederic | |
dc.contributor.author | Pollentier, Ivan | |
dc.contributor.author | Hendrickx, Eric | |
dc.contributor.author | Jonckheere, Rik | |
dc.contributor.author | Verhaegen, Staf | |
dc.contributor.author | Veloso, Anabela | |
dc.contributor.author | Vandenberghe, Geert | |
dc.contributor.author | Ronse, Kurt | |
dc.date.accessioned | 2021-10-17T22:25:16Z | |
dc.date.available | 2021-10-17T22:25:16Z | |
dc.date.issued | 2009 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/15360 | |
dc.source | IIOimport | |
dc.title | EUV lithography implementation on contact and metal interconnect level of a 22nm node 0.099um2 6T-SRAM cell | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Demuynck, Steven | |
dc.contributor.imecauthor | Van Roey, Frieda | |
dc.contributor.imecauthor | Baudemprez, Bart | |
dc.contributor.imecauthor | Hermans, Jan | |
dc.contributor.imecauthor | Lazzarino, Frederic | |
dc.contributor.imecauthor | Pollentier, Ivan | |
dc.contributor.imecauthor | Hendrickx, Eric | |
dc.contributor.imecauthor | Jonckheere, Rik | |
dc.contributor.imecauthor | Veloso, Anabela | |
dc.contributor.imecauthor | Vandenberghe, Geert | |
dc.contributor.imecauthor | Ronse, Kurt | |
dc.contributor.orcidimec | Hermans, Jan::0000-0003-1249-8902 | |
dc.contributor.orcidimec | Lazzarino, Frederic::0000-0001-7961-9727 | |
dc.contributor.orcidimec | Pollentier, Ivan::0000-0002-4266-6500 | |
dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.conference | International Symposium on Extreme Ultraviolet Lithography | |
dc.source.conferencedate | 18/10/2009 | |
dc.source.conferencelocation | Prague Czech Republic | |
imec.availability | Published - open access | |
imec.internalnotes | e-proceedings Sematech-website | |