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Conference contributions
EUV lithography implementation on contact and metal interconnect level of a 22nm node 0.099um2 6T-SRAM cell
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EUV lithography implementation on contact and metal interconnect level of a 22nm node 0.099um2 6T-SRAM cell
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Date
2009
Proceedings Paper
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18872.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Goethals, Mieke
;
Demuynck, Steven
;
Van Roey, Frieda
;
Baudemprez, Bart
;
Hermans, Jan
;
Huffman, Craig
;
Lazzarino, Frederic
;
Pollentier, Ivan
;
Hendrickx, Eric
;
Jonckheere, Rik
;
Verhaegen, Staf
;
Veloso, Anabela
;
Vandenberghe, Geert
;
Ronse, Kurt
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1903
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Acq. date: 2025-12-10
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Views
1903
since deposited on 2021-10-17
1
last month
Acq. date: 2025-12-10
Citations