Publication:

EUV lithography implementation on contact and metal interconnect level of a 22nm node 0.099um2 6T-SRAM cell

Date

2009
Proceedings Paper
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dc.contributor.authorGoethals, Mieke
dc.contributor.authorDemuynck, Steven
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorBaudemprez, Bart
dc.contributor.authorHermans, Jan
dc.contributor.authorHuffman, Craig
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorPollentier, Ivan
dc.contributor.authorHendrickx, Eric
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVerhaegen, Staf
dc.contributor.authorVeloso, Anabela
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorRonse, Kurt
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-10-17T22:25:16Z
dc.date.available2021-10-17T22:25:16Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15360
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography
dc.source.conferencedate18/10/2009
dc.source.conferencelocationPrague Czech Republic
dc.title

EUV lithography implementation on contact and metal interconnect level of a 22nm node 0.099um2 6T-SRAM cell

dc.typeProceedings paper
dspace.entity.typePublication
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