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Comparison of electrical measurements with structural analysis of thin high-k hafnium-based films

dc.contributor.authorHourdakis, E.
dc.contributor.authorTheodoropoulou, M.
dc.contributor.authorNassiopoulou, A.G.
dc.contributor.authorParisini, A.
dc.contributor.authorReading, M.A.
dc.contributor.authorvan den Berg, J.A.
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-17T22:57:12Z
dc.date.available2021-10-17T22:57:12Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15487
dc.sourceIIOimport
dc.titleComparison of electrical measurements with structural analysis of thin high-k hafnium-based films
dc.typeProceedings paper
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage363
dc.source.endpage372
dc.source.conferenceAnalytical Techniques for Semiconductor Materials and Process Characterization 6 - ALTECH
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 25, issue 3


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