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Progress towards passivation of Ge/high-k interfaces

dc.contributor.authorHoussa, Michel
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorMitard, Jerome
dc.contributor.authorDelabie, Annelies
dc.contributor.authorBellenger, Florence
dc.contributor.authorMeuris, Marc
dc.contributor.authorCaymax, Matty
dc.contributor.authorHeyns, Marc
dc.contributor.authorAfanasiev, Valeri
dc.contributor.authorStesmans, Andre
dc.date.accessioned2021-10-17T22:58:48Z
dc.date.available2021-10-17T22:58:48Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15493
dc.sourceIIOimport
dc.titleProgress towards passivation of Ge/high-k interfaces
dc.typeMeeting abstract
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorAfanasiev, Valeri
dc.contributor.imecauthorStesmans, Andre
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.source.peerreviewno
dc.source.beginpageC6.1
dc.source.conferenceMRS Spring Meeting symposium C: CMOS Gate Stack Scaling - Materials, Interfaces, and Reliability Implications
dc.source.conferencedate13/04/2009
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec


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