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A practical application of multiple parameters profile characterization (MPPC) using CD-SEM on production wafers using Hyper-NA lithography

dc.contributor.authorIshimoto, Toru
dc.contributor.authorSekiguchi, Kohei
dc.contributor.authorHasegawa, Norio
dc.contributor.authorWatanabe, Kenji
dc.contributor.authorLaidler, David
dc.contributor.authorCheng, Shaunee
dc.date.accessioned2021-10-17T23:07:32Z
dc.date.available2021-10-17T23:07:32Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15526
dc.sourceIIOimport
dc.titleA practical application of multiple parameters profile characterization (MPPC) using CD-SEM on production wafers using Hyper-NA lithography
dc.typeProceedings paper
dc.contributor.imecauthorLaidler, David
dc.contributor.orcidimecLaidler, David::0000-0003-4055-3366
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage72722E
dc.source.conferenceMetrology, Inspection and Process Control for Microlithography XXIII
dc.source.conferencedate22/02/2009
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 7272


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