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Investigation of EUV mask defectivity via full-field printing and inspection on wafer

dc.contributor.authorJonckheere, Rik
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorIwamoto, Fumio
dc.contributor.authorStepanenko, Nickolay
dc.contributor.authorMyers, Alan
dc.contributor.authorLamantia, Matthew
dc.contributor.authorGoethals, Mieke
dc.contributor.authorHendrickx, Eric
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-17T23:13:34Z
dc.date.available2021-10-17T23:13:34Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15548
dc.sourceIIOimport
dc.titleInvestigation of EUV mask defectivity via full-field printing and inspection on wafer
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage73790R
dc.source.conferencePhotomask and Next-Generation Lithography Mask Technology XVI
dc.source.conferencedate8/04/2009
dc.source.conferencelocationYokohama Japan
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 7379


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