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New cleaning solutions for all-wet-post etch residue removal on Cu BEOL for sub 45nm nodes
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Authors
Klipp, Andreas
;
Vereecke, Guy
;
Le, Quoc Toan
;
Claes, Martine
Conference
Sematech Surface Preparation and Cleaning Conference
Title
New cleaning solutions for all-wet-post etch residue removal on Cu BEOL for sub 45nm nodes
Publication type
Proceedings paper
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