Show simple item record

Characterisation of high-k containing nanolayers by reference-free X-ray fluorescence analysis with synchrotron radiation

dc.contributor.authorKolbe, M.
dc.contributor.authorBeckhoff, B.
dc.contributor.authorKrumrey, M.
dc.contributor.authorReading, M.
dc.contributor.authorVan den berg, J.
dc.contributor.authorConard, Thierry
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-17T23:34:13Z
dc.date.available2021-10-17T23:34:13Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15619
dc.sourceIIOimport
dc.titleCharacterisation of high-k containing nanolayers by reference-free X-ray fluorescence analysis with synchrotron radiation
dc.typeProceedings paper
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage293
dc.source.endpage300
dc.source.conferenceAnalytical Techniques for Semiconductor Materials and Process Characterization 6 - ALTECH
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 25, issue 3


Files in this item

Thumbnail
Name:
19296.pdf
Size:
687.0Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record