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Poly(olefin sulfone)s as non-chemically amplified photoresists for extreme ultraviolet (EUV) lithography
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Authors
Lawrie, Kirsten
;
Blakey, Idriss
;
Blinco, James
;
Gronheid, Roel
;
Jack, Kevin
;
Pollentier, Ivan
;
Leeson, Michael
;
Younkin, Todd R.
;
Whittaker, Andrew K.
Conference
11th Pacific Polymer Conference - PPC11
Title
Poly(olefin sulfone)s as non-chemically amplified photoresists for extreme ultraviolet (EUV) lithography
Publication type
Oral presentation
Embargo date
9999-12-31
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