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Application of UV irradiation in removal of post-etch 193 nm photoresist

dc.contributor.authorLe, Quoc Toan
dc.contributor.authorKesters, Els
dc.contributor.authorPrager, Lutz
dc.contributor.authorLux, Marcel
dc.contributor.authorMarsik, Premysl
dc.contributor.authorVereecke, Guy
dc.date.accessioned2021-10-17T23:51:08Z
dc.date.available2021-10-17T23:51:08Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15678
dc.sourceIIOimport
dc.titleApplication of UV irradiation in removal of post-etch 193 nm photoresist
dc.typeProceedings paper
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorVereecke, Guy
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.source.peerreviewyes
dc.source.beginpageD02-09
dc.source.conferenceMaterials, Processes and Reliability for Advanced Interconnects for Micro and Nanoelectronics
dc.source.conferencedate13/04/2009
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec
imec.internalnotesMRS Symposium Proceedings; Vol. 1156


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